Liquid source misted chemical deposition (LSMCD)–a critical review

Abstract

Abstract The aim of this paper is to describe a relatively new thin film deposition technique called Liquid Source Misted Chemical Deposition (LSMCD) that has been successfully utilized to synthesize a variety of multicomponent oxide materials. This report provides an understanding of the basic principles of operation and the suitability, performance, capabilities and drawbacks for production applications using LSMCD.