Publication | Closed Access
Effect of H2 dilution gas on the growth of ZrC during low pressure chemical vapor deposition in the ZrCl4–CH4–Ar system
28
Citations
11
References
2008
Year
Materials ScienceChemical EngineeringEngineeringZrcl4–ch4–ar SystemH2 Dilution GasHydrogenChemistryChemical DepositionChemical Vapor Deposition
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