Ripple Wave Vector Rotation in Anisotropic Crystal Sputtering

Abstract

Surface morphology of a Cu(110) crystal, generated by ion sputtering, has been investigated by scanning tunneling microscopy. Different from recent theoretical predictions and experimental results, normal sputtering produces a well defined ripple structure whose wave vector rotates from $〈001〉$ to $〈1\overline{1}0〉$ by increasing the substrate temperature. Off-normal sputtering at low temperature (180 K) generates ripples whose orientation depends on both ion direction and surface azimuthal orientation. These results are described by a continuum equation which includes both surface curvature dependent erosion terms and diffusion terms accounting for surface anisotropy and Ehrlich-Schwoebel barriers.