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Growth of Mixed-Phase Amorphous and Ultra Nanocrystalline Silicon Thin Films in the Low Pressure Regime by a VHF PECVD Process

Materials ScienceVhf Pecvd ProcessEngineeringNanotechnologyNanoelectronicsSilicon On InsulatorApplied PhysicsMixed-phase AmorphousChemical Vapor DepositionThin FilmsAmorphous SolidMicroelectronicsLow Pressure RegimeThin Film Processing