The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering - Concepedia

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The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering

105

Citations

18

References

2007

Year

Jens Emmerlich, Stanislav Mráz, Rony Snyders, Kaiyun Jiang, Jochen M. Schneider

Low Deposition RateEngineeringPhysicsApplied PhysicsPulsed Laser DepositionPhysical ReasonChemical DepositionSynchrotron RadiationMicroelectronicsGas Discharge Plasma

References

	Year	Citations

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