Vertical alignment of liquid crystals on a fully oxidized HfO2 surface by ion bombardment

Abstract

High-performance liquid crystals (LCs) driven at a 0.9 V threshold were demonstrated on very thin HfO2 films with vertical (homeotropic) alignment by ion bombardment. Atomic layer deposition was used to obtain LC orientation on ultrathin high-quality films of double-layer HfO2/Al2O3. X-ray photoelectron spectroscopy indicated that full oxidization of HfO2 film surfaces was induced by ion bombardment, shifting the Hf 4f spectra to lower binding energies. The increased intensities of the Hf 4f peaks after ion bombardment confirmed that nonstoichiometric HfOx was converted to the fully oxidized HfO2 surfaces.