Supercritical Water Oxidation of a PCB of 3-Chlorobiphenyl Using Hydrogen Peroxide

Abstract

Abstract The supercritical water oxidation (SCWO) of a PCB of 3-chlorobiphenyl (1) was carried out at a temperature of 673 K and a pressure of 30 MPa with a flow reactor. The initial concentrations of (1) and hydrogen peroxide ranged from 1.84 × 10−3 to 8.74 × 10−2 M (1 M = 1 mol dm−3), and 0.181 to 2.67 M, respectively. The decomposition of (1) was higher than 99.9% so long as hydrogen peroxide was stoichiometrically added.