Publication | Open Access
Dependence of Curie temperature on the thickness of an ultrathin ferroelectric film
37
Citations
30
References
2010
Year
EngineeringCurie TemperatureThickness DependencyThin Film Process TechnologyUltrathin FilmsUltrathin Ferroelectric FilmFerroelectric ApplicationScaling LawThin Film ProcessingMaterials SciencePhysicsCrystalline DefectsSemiconductor MaterialPyroelectricitySolid-state PhysicMaterial AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsFerroelectric MaterialsThin Films
The thickness dependency of the Curie temperature in stress-free $\text{Pb}({\text{Zr}}_{0.5}{\text{Ti}}_{0.5}){\text{O}}_{3}$ ultrathin films under open-circuit conditions is revealed from the computation of some nontrivial statistical quantities (such as fourth-order cumulants), via a first-principles-based technique. For thicknesses above $16\text{ }\text{\AA{}}$, this dependency follows the usual finite-size scaling law with a critical exponent that is consistent with the one associated with the three-dimensional-random-Ising universality class. On the other hand, the Curie temperature-versus-film's thickness curve deviates from this scaling law below $12\text{ }\text{\AA{}}$ while being rather well described by an empirical equation down to $8\text{ }\text{\AA{}}$.
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