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Magnetic and other properties and sputtering behavior of Co-base amorphous alloy films
34
Citations
15
References
1987
Year
Magnetic PropertiesEngineeringAlloy SputteringThin Film Process TechnologyMagnetic MaterialsMagnetismMagnetic Data StorageMagnetic Thin FilmsThin Film ProcessingMaterials ScienceMaterials EngineeringMagnetic MaterialAmorphous MetalMicrostructureMagnetic MediumOther PropertiesSputtering ConditionsApplied PhysicsSingle FilmThin FilmsAmorphous Solid
Magnetic and other properties of Co-base amorphous alloy films prepared by sputtering are investigated. A detailed magnetic phase diagram with saturation magnetic flux density, crystallization temperature, and zero-magnetostrictive line on Co-Ta-Zr amorphous alloys were obtained, and the technical knowhow to make a film with well-reproducible characteristics by widely changing the sputtering conditions was related with these physical properties. Especially on alloy sputtering, a phenomenological model for elucidating a composition difference between film and target is presented. After these studies, the film characteristics of Bs=12 kG, Tx=450 °C, ‖λs‖<10−8, Hc<10 mOe, and permeabilities of μ(1 MHz)=7000, μ(100 MHz)=2000 for the single film of 2 μm in thickness and of μ(1 MHz)=4000, μ(100 MHz)=800 for the insulator-sandwiched multilayered film of 10 μm are obtained, and these well-balanced values enable us to apply the materials for high-frequency recording head.
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