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Optimization of erbium-doped light-emitting diodes by <i>p</i>-type counterdoping
14
Citations
12
References
1999
Year
SemiconductorsElectrical EngineeringElectronic DevicesOptical MaterialsEngineeringSolid-state LightingPhotoluminescenceApplied PhysicsEl PowerNew Lighting TechnologyEr3+ IonsLight-emitting DiodesOptoelectronic DevicesDark RegionLuminescence PropertyErbium-doped Light-emitting DiodesOptoelectronicsCompound Semiconductor
In this letter, we report on the influence of the space charge region width in erbium- and oxygen-doped silicon light-emitting diodes on the electroluminescence (EL) power at 1.54 μm under reverse bias conditions. The space charge region width was varied by codoping the Si:Er:O layer with boron, thereby compensating the Er–O donors. We observe a strong enhancement of the EL power with increasing width. The data indicate the existence of a dark region of approximately 45 nm in the pn junction, in which no light is generated due to a lack of hot carriers which are necessary for impact excitation of Er3+ ions.
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