Concepedia

Publication | Closed Access

Evaluation of properties of Ta–Ni amorphous thin film for copper metallization in integrated circuits

DOI

10

Citations

9

References

2007

Year

Jau-Shiung Fang, Ting-Chang Hsu, M. L. Ker, H.C. Chen, J.H. Lee, Chia-Ming Hsu, Ling Yang
Journal of Physics and Chemistry of Solids

References

YearCitations

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