Publication | Closed Access
Nitrogen-related recombination mechanisms in p-type ZnO films grown by plasma-assisted molecular beam epitaxy
66
Citations
30
References
2007
Year
Recombination MechanismsEngineeringP-type Zno FilmsChemistryLuminescence PropertyFa TransitionIi-vi SemiconductorNitrogen-related Recombination MechanismsMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorMaterials SciencePhotoluminescenceNanotechnologyOxide ElectronicsFa LuminescenceApplied PhysicsThin FilmsOptoelectronics
The recombination mechanisms of nitrogen-related emissions in p-type ZnO films were investigated by photoluminescence (PL) measurements. The enhanced peak at 3.260 eV was confirmed as a donor-acceptor pair (DAP) transition and the emission around 3.310 eV was assigned to the free electron to acceptor (FA) recombination by studying the temperature evolution of DAP and FA luminescence, calculating the energy level of the corresponding nitrogen acceptor, and measuring the decay time of DAP transition. By comparing the PL spectra of the samples with various hole concentrations, it can be found that as the hole concentration increases, the DAP peak significantly dominates the spectra. In addition, the acceptor binding energy is estimated to be about 120 meV from the FA transition, which is in good agreement with the value calculated by a hydrogenic acceptor model.
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