Publication | Closed Access
Characteristics of rutile TiO2 films prepared by r.f. magnetron sputtering at a low temperature
75
Citations
10
References
1996
Year
Materials ScienceMagnetismMaterials EngineeringMaterial AnalysisEngineeringPhysicsOxide ElectronicsApplied PhysicsThin FilmsRutile Tio2 FilmsThin Film ProcessingLow Temperature
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