Publication | Closed Access
Dielectric polarization relaxation measurement in α-SiO2 by means of a scanning electron microscope technique
15
Citations
14
References
1993
Year
Relaxation ProcessElectrical EngineeringEngineeringPhysicsOptical PropertiesStress-induced Leakage CurrentOxide ElectronicsApplied PhysicsElectron Microscope TechniqueTime-dependent Dielectric BreakdownDielectric RelaxationMicroanalysisSemiconductor MaterialScanning Electron MicroscopeSilicon On InsulatorMetallic ApertureElectrical PropertyElectrical Insulation
A scanning electron microscope is used as a tool to study dielectric relaxation processes in α-SiO2 by measuring the leakage current in the sample surrounded by a metallic aperture. A transient time (tt) of the order of a few seconds appears before the steady-state current is established. The time dependence of the trapping rate is found to follow a power law and to be related to relaxation processes of a dielectric under electrical and thermal stress.
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