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Deposition of luminescent a-SiN x :H Films with SiH4–N2 gas mixture by VHF–PECVD using novel impedance matching method

EngineeringLuminescent A-sin XSurface ScienceApplied PhysicsSih4–n2 Gas MixtureChemistryThin FilmsChemical DepositionH FilmsThin Film Process TechnologyChemical Vapor DepositionThin Film Processing