Pulsed reactive chemical vapor deposition in the C-Ti-Si system from H2/TiCl4/SiCl4 - Concepedia

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Pulsed reactive chemical vapor deposition in the C-Ti-Si system from H2/TiCl4/SiCl4

DOI Full Paper Access

43

Citations

17

References

2004

Year

Sylvain Jacques, H. Di-Murro, M. P. Berthet, H. Vincent

Thin Solid Films

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringC-ti-si SystemSurface ScienceApplied PhysicsSemiconductor Device FabricationChemical DepositionPulsed Laser DepositionChemical Vapor DepositionCarbide

References

	Year	Citations

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