2010 · 76 citations · 12 references
EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesSemiconductor MaterialsHigh-frequency Semiconductor DevicesIntegrated Circuit DesignIntegrated Circuit FabricationRadio-frequency Integrated CircuitsSemiconductor HeterostructuresSemiconductor PhysicsBreakdown VoltageHigh-frequency ElectronicsIntegrated Waveguide CircuitsMicrowave TransistorsMillimeter-wave TransistorsTerahertz Semiconductor Devices
We report on the development of a 0.25 μm InP HBT technology suitable for integrated circuit demonstrations at the lower end of the THz frequency band (0.3-3THz). Transistors demonstrate an extrapolated f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> of >800 GHz while maintaining a common-emitter breakdown voltage (BV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">CEO</sub> ) >4 V. The transistors have been integrated in a full IC process that includes three-levels of interconnects, backside wafer thinning to 50 μm with a through-wafer via process, and a backside etch singulation process that allows for the formation of free-standing integrated waveguide probes. The technology has been utilized to demonstrate amplifiers, fixed-frequency and voltage controlled oscillators and dynamic frequency dividers all operating at >300 GHz.
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Sub 50 nm InP HEMT Device with Fmax Greater than 1 THz
THz MMICs based on InP HBT Technology
J.B. Hacker, Munkyo Seo, Adam Young et al. · 2010 IEEE MTT-S International Microwave Symposium · 2010 · 65 citations