Publication | Closed Access
Fabrication and characterization of narrow stripe InGaAsP/InP buried heterostructure lasers
93
Citations
5
References
1980
Year
PhotonicsEngineeringLaser ScienceStripe WidthSemiconductor LasersApplied PhysicsLaser ApplicationsIngaasp/inp Buried-heterostructure LasersLaser MaterialTemperature LimitOptoelectronic DevicesMolecular Beam EpitaxyOptoelectronicsHigh-power LasersCompound SemiconductorNarrow Stripe Ingaasp/inp
InGaAsP/InP buried-heterostructure lasers with a stripe width of 1–2 μm have been fabricated by two-step liquid phase epitaxy and preferential chemical etching. They operate in the fundamental transverse mode at wavelengths of ∼1.3 μm with threshold current as low as 22 mA. The temperature limit for cw operation is 80 °C.
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