Publication | Open Access
Fabrication of semiconductor Kagome lattice structure by selective area metalorganic vapor phase epitaxy
25
Citations
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References
2003
Year
Materials ScienceSemiconductorsGaas Quantum WiresEngineeringPhysicsApplied PhysicsQuantum MaterialsCondensed Matter PhysicsSemiconductor NanostructuresSemiconductor MaterialExperimental RealizationKagome MaterialsMolecular Beam EpitaxyEpitaxial GrowthCompound SemiconductorChemical Vapor DepositionKagome Lattice Structure
Artificial two-dimensional semiconductor Kagome lattice structures formed by quantum wires can show ferromagnetism when the flatband is half filled, even though it does not have any magnetic elements. Experimental realization of such a Kagome lattice structure is reported. The structure, with different pattern periods, was formed with GaAs quantum wires by selective area metalorganic vapor phase epitaxy on GaAs (111)B substrates. To overcome the lateral overgrowth and to improve the shape of smaller period pattern, flow rate modulation epitaxy was employed and a GaAs Kagome lattice structure with 1 μm period was effectively grown.
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