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High-power multiple-quantum-well GaInAsSb/AlGaAsSb diode lasers emitting at 2.1 μm with low threshold current density
126
Citations
5
References
1992
Year
Wide-bandgap SemiconductorEngineeringLaser ScienceLaser ApplicationsLaser MaterialSuper-intense LasersSurface-emitting LasersHigh-power LasersLaser ControlSemiconductor LasersQuantum-well Active RegionMolecular Beam EpitaxyPhotonicsAluminum Gallium NitrideLaser DesignApplied PhysicsHigh-energy LasersLasers 100Optoelectronics
The first GaInAsSb/AlGaAsSb diode lasers with a quantum-well active region have been demonstrated. These devices, which were grown by molecular beam epitaxy, emit at ∼2.1 μm. For room-temperature pulsed operation of lasers 100 μm wide, threshold current density as low as 260 A/cm2 and differential quantum efficiency up to 70% have been obtained for cavity lengths of 2000 and 300 μm, respectively. One device 100 μm wide and 1000 μm long has operated pulsed at heatsink temperatures up to 150 °C, with a characteristic temperature of 113 K between 20 and 40 °C. For another device of the same dimensions, cw output power up to 190 mW/facet has been achieved at a heatsink temperature of 20 °C. These characteristics represent a dramatic improvement in performance over double-heterostructure GaInAsSb/AlGaAsSb diode lasers.
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