Measurements of specific copper surface area by a pulse chromatographic technique

Abstract

The method for determination of specific copper area by decompositive adsorption of N 2 O has been investigated using pulse chromatographic technique. The reaction is accompanied by activated adsorption of oxygen. The amount of oxygen adsorbed depends linearly upon the temperature in the range of -20 to +90 °C. The existence of an oxygen monolayer in the temperature range from 90 to 120 °C has been proved. On the surface, the Cu:O ratio is equal to 2. The rate of decompositive N 2 O adsorption is very high. The weakly bonded oxygen can be desorbed at 100 °C into a stream of inert gas and the rate of oxygen desorption depends on the temperature of decompositive N 2 O adsorption. An improved procedure for measuring copper surface area by pulse chromatographic technique have been suggested.