Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy - Concepedia

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Growth kinetics of thermal oxidation process on Si(100) by real time ultraviolet photoelectron spectroscopy

45

Citations

4

References

1996

Year

Yoshiharu Enta, Y. Takegawa, Maki Suemitsu, N. Miyamoto

Applied Surface Science

Materials ScienceEngineeringThermal Oxidation ProcessOxidation ResistanceSurface ScienceApplied PhysicsSemiconductor Device FabricationVacuum DeviceSilicon On InsulatorGrowth KineticsChemical KineticsChemical Vapor Deposition

References

	Year	Citations

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