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Metalorganic vapor phase epitaxy of coherent self-assembled InAs nanometer-sized islands in InP(001)
99
Citations
19
References
1997
Year
SemiconductorsMaterials ScienceAverage DiameterOptical MaterialsEngineeringNanotechnologyOptoelectronic MaterialsApplied PhysicsSurface ScienceStandard DeviationCoherent IslandsOptoelectronic DevicesMolecular Beam EpitaxyNanoscale ScienceEpitaxial GrowthCompound SemiconductorChemical Vapor DepositionSemiconductor Nanostructures
The metalorganic vapor phase epitaxy of coherent self-assembled InAs islands on InP(001) is demonstrated. Samples are characterized using transmission electron microscopy and photoluminescence (PL) spectroscopy at 77 K. The deposition of ∼2.4–4.8 monolayers (ML) of InAs at 500°C followed by a 30 s growth interruption results in the formation of coherent islands whose average diameter is 30–35 nm with a standard deviation of 8 nm and whose areal density is (3–4)×1010 cm−2. The PL emission is centered at 0.79 eV and has a full width at half maximum (FWHM) of 90 meV. When the nominal deposited thickness is increased to ∼9.6 ML, the average island diameter increases to ∼120 nm while the areal density decreases to ∼109 cm−2. The resulting PL is then centered at 0.83 eV with a FWHM of 130 meV and also displays a peak at 1.23 eV which is attributed to an InAs wetting layer ∼2 ML in thickness.
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