Materials science forum · 2012 · 26 citations · 6 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsCarrier TransportSemiconductor Device MaterialsSemiconductor PhysicsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsGate LeakageHigh-temperature Device OperationHigh-temperature PerformanceLeakageSilicon CarbideSilicon Carbide (Sic) MaterialsSilicon Carbide Power DevicesTemperature Dependence
Transistor performances of lateral and vertical 3C-SiC MOSFETs are investigated in the temperature range of 25 °C to 300 °C. Both types of MOSFETs operate up to 300 °C and the lateral MOSFETs possess peak channel mobility of more than 100 cm 2 /(Vs) even at 300 °C for the [110]- and [-110]-channel directions. In both MOSFETs, on-currents decrease monotonically and threshold voltages shift negatively as the temperature increases. The temperature dependence of on-currents in the lateral MOSFETs is weaker than that in the vertical MOSFETs. The leakage current at the negative gate voltage increases at above 200 °C. The activation energies calculated from the leakage currents at 200 °C and 300 °C are about half of the 3C-SiC bandgap energy of 2.3 eV.
6
Traps at the SiC/SiO<sub>2</sub>-Interface
Gerhard Pensl, Florin Ciobanu, Valeri Afanas’ev et al. · MRS Proceedings · 2000 · 56 citations
3C-SiC MOSFET with High Channel Mobility and CVD Gate Oxide
Motoki Kobayashi, Hidetsugu Uchida, A. Minami et al. · Materials science forum · 2011 · 25 citations
Mietek Bakowski, Adolf Schöner, Per Ericsson et al. · Journal of Telecommunications and Information Technology · 2007 · 24 citations · Full text