Structural properties of a-Si1−xNx:H films grown by plasma enhanced chemical vapour deposition by SiH4 + NH3 + H2 gas mixtures - Concepedia

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Structural properties of a-Si1−xNx:H films grown by plasma enhanced chemical vapour deposition by SiH4 + NH3 + H2 gas mixtures

65

Citations

27

References

1997

Year

Fabrizio Giorgis, Candido Fabrizio Pirri, E. Tresso

Thin Solid Films

Materials EngineeringMaterials ScienceStructural PropertiesEngineeringNanotechnologySilicon On InsulatorSurface ScienceApplied PhysicsChemistryChemical Vapor DepositionH FilmsPlasma ProcessingThin Film Processing

References

	Year	Citations

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