Enhanced conductivity of zinc oxide thin films by ion implantation of hydrogen atoms

Abstract

Enhancement of the conductivity of zinc oxide through doping with hydrogen atoms was examined by using ion implantation of highly resistive thin films deposited by rf magnetron sputtering at room temperature. With a doping of 1×1017 atoms cm−2, the conductivity after annealing at 200 °C in an N2 atmosphere at 1 atm rose from the initial 1×10−7 Ω−1 cm−1 to 5.5×102 Ω−1 cm−1.