Publication | Closed Access
Atomistic simulation of point defects in silicon at high temperature
50
Citations
1
References
1996
Year
EngineeringPoint DefectsSilicon On InsulatorDefect ToleranceMolecular DynamicsSemiconductorsThermodynamicsPhysicsCrystalline DefectsBias Temperature InstabilityIntrinsic ImpurityAtomic PhysicsDefect FormationSolid-state PhysicSilicon DebuggingCrystalline SiliconStillinger–weber Interatomic PotentialApplied PhysicsCondensed Matter PhysicsAmorphous SolidHigh Temperature
The Stillinger–Weber interatomic potential is used in molecular dynamics simulations to compute estimates of the equilibrium and transport properties of self-interstitials and vacancies in crystalline silicon at high temperature. Equilibrium configurations are predicted as a 〈110〉 dumbbell for a self-interstitial, and as an inwardly relaxed configuration for a vacancy. Both structures show considerable delocalization with increasing temperature, which leads to a strong temperature dependence of the entropy of formation, as suggested by diffusion experiments. Diffusion coefficients and mechanisms are predicted as a function of temperature. The predictions are discussed in the context of experiments and first-principle calculations.
| Year | Citations | |
|---|---|---|
Page 1
Page 1