Characterization of X-ray Induced Damage in Alkanethiolate Monolayers by High-Resolution Photoelectron Spectroscopy

Abstract

Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.