IEEE Transactions on Nuclear Science · 1964 · 35 citations · 7 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsRadiation DetectionSemiconductor DevicesGamma-ray DetectionGamma-ray DetectorsGamma-ray InstrumentationGamma-ray SpectroscopyRadiation SpectroscopySemiconductor DetectorsDetector ConstructionGamma-ray Detector TechnologyGamma-ray SpectrometryGermanium DetectorsHigh-resolution SpectrometryLithium-drifted DetectorsLow-noise AmplifiersSemiconductor Gamma-ray Detectors
Germanium and silicon p-i-n diodes with active volumes up to 2 cm3 have been fabricated using the lithium-ion drift technique. p-type germanium doped with either gallium or zinc (5-10 ohm-cm) and boron-doped silicon (1100 ohm-cm) were the base materials. Diodes were operated at 77°K in conjunction with a low noise amplifier system (270 RMS electron-holes). They have been used as gamma-ray pair spectrometers, germanium diodes giving a resolution of 7 keV (FWHM) at 2.75 MeV gamma-ray energy increasing to 10 keV at 7.64 MeV; resolution from a silicon device was slightly inferior. A germanium diode has been used as the central detector in a triple-crystal pair spectrometer incorporating two NaI scintillators. This arrangement improved the ratio of the height of the pair peak to the background below the peak from 7:1 to 150:1 for 2.75 MeV gamma-rays from a Na24 source.
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Drift Mobilities in Semiconductors. I. Germanium
M. B. Prince · Physical Review · 1953 · 317 citations
Mobility of Impurity Ions in Germanium and Silicon
C. S. Fuller, J. C. Severiens · Physical Review · 1954 · 316 citations