Microwave absorption at the fundamental electron cyclotron resonance and potential formation in a tandem mirror

Abstract

Strong one-pass absorption of high-power microwaves is observed at the fundamental electron cyclotron resonance in an axisymmetric end mirror of the GAMMA 10 tandem mirror [Phys. Rev. Lett. 55, 939 (1985); Phys. Fluids 29, 2781 (1986)]. The radial profile of microwave power deposition is directly measured without the influence of wall reflection. It coincides with that of the axial flow of warm electrons driven by the fundamental heating as well as with that of the plasma potential at the resonance. This indicates that strong electron cyclotron heating largely affects the potential formation through driving an axial flow of warm electrons.