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Sputtering of neutral and ionic indium clusters
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1994
Year
EngineeringNuclear PhysicsIonic Indium ClustersIon Beam InstrumentationChemistryIon ProcessIndium ClustersNeutral ClusterIon BeamIon EmissionSecondary IonCluster SciencePhysicsAtomic PhysicsNuclear AstrophysicsNatural SciencesSurface ScienceApplied PhysicsCluster ChemistryIon Structure
Secondary neutral and secondary ion cluster yields were measured during the sputtering of a polycrystalline indium surface by normally incident ∼4 keV Ar+ ions. In the secondary neutral mass spectra, indium clusters as large as In32 were observed. In the secondary ion mass spectra, indium clusters up to In18+ were recorded. Cluster yields obtained from both the neutral and ion channel exhibited a power law dependence on the number of constituent atoms n in the cluster, with the exponents measured to be −5.6 and −4.1, respectively. An abundance drop was observed at n=8, 15, and 16 in both the neutral and ion yield distributions, suggesting that the stability of the ion (either secondary ion or photoion) plays a significant role in the observed distributions. In addition, our experiments suggest that unimolecular decomposition of the neutral cluster may also play an important role in the measured yield distributions.