Publication | Open Access
Potential measurement by use of a negative-ion source
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1985
Year
Plasma PotentialEngineeringPotential MeasurementMeasurementInstrument ScienceNeutralized BeamEducationPlasma PhysicsAnalytical ChemistryIon BeamPlasma Potential MeasurementInstrumentationIon EmissionIon Process
A negative-ion beam and the neutralized beam are used for plasma potential measurement. Advantages of this method are discussed and the method is applied to measure the plasma potential in GAMMA-6 and GAMMA-10 tandem mirror devices.