Concepedia

Publication | Closed Access

FTIR, AFM and PL properties of thin SiOx films deposited by HFCVD

DOI

40

Citations

15

References

2010

Year

José Alberto Luna López, G. Garcı́a-Salgado, T. Díaz-Becerril, J. Carrillo López, D. E. Vázquez Valerdi, H. Juárez-Santiesteban, E. Rosendo-Andrés, Antonio Coyopol
Materials Science and Engineering B

References

YearCitations

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