Simulation of the crystallization of thin films by rapid thermal processing

Abstract

A computer simulation has been performed of phase transformations taking place in thin films under various time–temperature regimes. The conditions used resemble those encountered in the rapid thermal processing of thin films. The effect of heating rate and final temperature have been studied in detail. It is observed that the two parameters can strongly influence the grain size and the grain size distribution within the films. The feasibility of using multiple step rapid thermal processing to optimize thin film microstructure is demonstrated.