Epitaxial films of semiconducting FeSi2 on (001) silicon

John E. Mahan, K.M. Geib, G. Y. Robinson, Robert G. Long, Yan Xinghua, Gang Bai, Marc‐A. Nicolet, M. Nathan

Applied Physics Letters · 1990 · 177 citations · 8 references

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Abstract

Epitaxial thin films of the semiconducting transition metal silicide, beta-FeSi2, were grown on (001) silicon wafers. The observed matching face relationship is FeSi2(100)/Si(001), with the azimuthal orientation being FeSi2[010]‖‖Si〈110〉. This heteroepitaxial relationship has a common unit mesh of 59 Å2 area, with a mismatch of 2.1%. There is a strong tendency toward island formation within this heteroepitaxial system.

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