Applied Physics Letters · 1990 · 177 citations · 8 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsEpitaxial GrowthSemiconductor HeterostructuresSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesSemiconductor Thin FilmsEpitaxial Film GrowthEpitaxial MaterialsEpitaxial Thin FilmsEpitaxial Thin-film GrowthHeteroepitaxial GrowthHeteroepitaxySiliconSilicon Wafers
Epitaxial thin films of the semiconducting transition metal silicide, beta-FeSi2, were grown on (001) silicon wafers. The observed matching face relationship is FeSi2(100)/Si(001), with the azimuthal orientation being FeSi2[010]‖‖Si〈110〉. This heteroepitaxial relationship has a common unit mesh of 59 Å2 area, with a mismatch of 2.1%. There is a strong tendency toward island formation within this heteroepitaxial system.
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Lattice match: An application to heteroepitaxy
A. Zur, T. C. McGill · Journal of Applied Physics · 1984 · 388 citations
A clarification of the index of refraction of beta-iron disilicide
M. Bost, John E. Mahan · Journal of Applied Physics · 1988 · 251 citations · Full text
Natural Sciences, Chemistry, Physics +12
JohnS. Foord · Journal of Electroanalytical Chemistry · 1985 · 141 citations