Publication | Open Access
Epitaxial films of semiconducting FeSi2 on (001) silicon
176
Citations
8
References
1990
Year
Materials ScienceOxide HeterostructuresSemiconductorsEngineeringEpitaxial FilmsCrystalline DefectsTransition Metal SilicideApplied PhysicsSemiconductor Device FabricationEpitaxial Thin FilmsThin FilmsMolecular Beam EpitaxyEpitaxial GrowthIsland FormationSilicon On Insulator
Epitaxial thin films of the semiconducting transition metal silicide, beta-FeSi2, were grown on (001) silicon wafers. The observed matching face relationship is FeSi2(100)/Si(001), with the azimuthal orientation being FeSi2[010]‖‖Si〈110〉. This heteroepitaxial relationship has a common unit mesh of 59 Å2 area, with a mismatch of 2.1%. There is a strong tendency toward island formation within this heteroepitaxial system.
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