Applied Physics Letters · 1976 · 67 citations · 5 references
Natural SciencesElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDielectric MaterialsDielectric PropertiesDielectricsSemiconductor Device MaterialsSemiconductor SurfacesThin Film OxidationBand GapCapacitance-voltage CharacterizationCapacitance-voltage MeasurementsCapacitance-voltage RelationsElectrical BreakdownFilm Breakdown MechanismsThin-film Dielectrics
Wet chemical anodic oxidation of InP in a 1% by weight solution of sodium salicylate in ethyl alcohol is shown to result in the growth of a high-quality dielectric layer. Resistivities in excess of 1013 Ω cm at room temperature have been realized with breakdown fields ∼106 V/cm. Apparent surface state densities as determined from 1-MHz capacitance-voltage plots are in the range 3–4×1011 cm−2 eV−1 over a large portion of the band gap.
5
Three-level oscillator: a new form of transferred-electron device
C. Hilsum, H.D. Rees · Electronics Letters · 1970 · 124 citations
High-efficiency microwave generation in InP
D.J. Colliver, K.W. Gray, B.D. Joyce · Electronics Letters · 1972 · 20 citations
Engineering, Electrical Engineering, Microwave Engineering +15