Anisotrophy control of Ni-Fe films through sequenced-field deposition

Abstract

Anisotropy of nickel-iron films of 82, 74, and 66 per cent nickel compositions was controlled by time-sequenced application of orthogonal fields during deposition. Resulting anisotropy values are in agreement with simple <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">M</tex> -induced anisotropy principles. Coercive forces show small but definite decrease with anisotropy constant. Dispersion angle is proportional to the reciprocal of the anisotropy constant. The technique is suitable for production of low-H <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">k</inf> films. It permits nonanomalous inverted films to be produced and allows the study of other anisotropy sources.