Publication | Closed Access
Efficient generation at 421 nm by resonantly enhanced doubling of GaAlAs laser diode array emission
65
Citations
4
References
1989
Year
Optical PumpingPhotonicsElectrical EngineeringEfficient GenerationNm PowerEngineeringOptical PropertiesConversion EfficiencyApplied PhysicsLaser ApplicationsOptical Ceramic842-Nm Diffraction-limited EmissionOptoelectronicsHigh-power LasersCompound SemiconductorFiber Laser
The 842-nm diffraction-limited emission from an injection-locked laser diode array was frequency doubled using a monolithic spherical-mirror KNbO3 crystal cavity. Maximum unidirectional external 421 nm power of 24 mW was generated with 167 mW of pump power. Maximum total internal second-harmonic power and conversion efficiency of 64 mW and 45% were obtained. Effects of heating in the crystal are described.
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