Dissipative continuum model for self-organized pattern formation during ion-beam erosion

Abstract

A continuum model, based on the damped Kuramoto-Sivashinsky equation, is shown to reproduce the morphology evolution during ion sputtering quite successfully. In a very narrow range of the damping parameter $\ensuremath{\alpha},$ the alignment of the structures into hexagonal domains is obtained under normal incidence of ions with striking resemblance to the experimentally observed dot patterns. The origin of this damping factor is discussed.