Nitride films deposited from an equimolar Al–Cr–Mo–Si–Ti alloy target by reactive direct current magnetron sputtering - Concepedia

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Nitride films deposited from an equimolar Al–Cr–Mo–Si–Ti alloy target by reactive direct current magnetron sputtering

110

Citations

28

References

2008

Year

Hui-Wen Chang, Ping-Kang Huang, A. Davison, Jien‐Wei Yeh, Chun-Huei Tsau, Chih-Chao Yang

Thin Solid Films

Materials ScienceMaterials EngineeringAluminium NitrideEngineeringApplied PhysicsNitride FilmsThin Film Process TechnologyThin FilmsChemical DepositionThin Film Processing

References

	Year	Citations

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