Publication | Closed Access
The physics and backward diode behavior of heavily doped single layer MoS2 based p-n junctions
38
Citations
17
References
2013
Year
Ii-vi SemiconductorElectrical EngineeringEngineeringPhysicsNanoelectronicsOxide ElectronicsApplied PhysicsQuantum MaterialsGrapheneP-n JunctionsTwo-dimensional Mos2Semiconductor MaterialIntrinsic BandgapBackward Diode BehaviorMicroelectronicsSingle Layer Mos2Semiconductor Device
The single layer MoS2 is attractive for the use in the next-generation low power nanoelectronic devices because of its intrinsic bandgap compared to graphene. In this work, we investigated the transport property of a p-n junction based on two-dimensional MoS2. The n-type and p-type doping are realized through substituting sulfur with chlorine and phosphorus. The device exhibited backward diode-like behavior with large rectifying ratios. We attribute the observed current-voltage characteristics to different heavy doping effect caused by chlorine and phosphorus. Our results may throw light on the electronic modulation of MoS2 and realizations of complemented logics devices based on MoS2.
| Year | Citations | |
|---|---|---|
Page 1
Page 1