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New high-pressure phase of Si
239
Citations
31
References
1993
Year
Materials EngineeringMaterials ScienceEngineeringGpa RangePhysicsHigh-pressure BehaviorCondensed Matter PhysicsApplied PhysicsSiliceneSemiconductor Device FabricationImage-plate Area DetectorSilicon On InsulatorNew High-pressure Phase
Angle-dispersive powder-diffraction techniques utilizing an image-plate area detector have been used to reexamine the high-pressure behavior of silicon to \ensuremath{\sim}18 GPa. We have observed a new intermediate body-centered orthorhombic structure between the well-known Si II (\ensuremath{\beta}-tin) and Si V (simple-hexagonal) structures. The existence of such a phase has been considered previously in energy calculations, and may pertain to the observed pressure dependence of the superconducting transition temperature of Si in the 13--18 GPa range.
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