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Observation of multiple Er3+ sites in Er-implanted GaN by site-selective photoluminescence excitation spectroscopy
84
Citations
11
References
1997
Year
EngineeringPhotoluminescence ExcitationOptical AbsorptionOptoelectronic DevicesMultiple Er3+ SitesChemistryLuminescence PropertyEr-implanted GanElectronic DevicesOptical PropertiesCompound SemiconductorExciton BoundElectrical EngineeringPhotoluminescenceOptoelectronic MaterialsAluminum Gallium NitrideCategoryiii-v SemiconductorApplied PhysicsGan Power DeviceOptoelectronics
Photoluminescence (PL) and photoluminescence excitation (PLE) spectroscopies have been carried out at 6 K on the 1540 nm I13/24→I15/24 emission of Er3+ in Er-implanted films of GaN grown by metalorganic chemical vapor deposition. The PLE spectra exhibit several broad below-gap absorption bands, which excite three distinct site-selective Er3+ PL spectra. The excitation of two of the site-selective Er PL bands involves optical absorption by defects or background impurities, rather than direct intra-f shell absorption, with subsequent nonradiative transfer of the energy to nearby Er3+ luminescence centers. The characteristics of the PLE spectrum of the third site-selective PL band suggest that an exciton bound at an Er-related trap is involved in the excitation mechanism.
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