Ultrasmooth Patterned Metals for Plasmonics and Metamaterials

Perfectly Flat? Plasmonic devices, which exploit the interactions of light with surface electrons, show great promise for applications in sensing, communications, and energy conversion. A key hindrance is the deposition of patterned metals used for plasmonics, because, as deposited, the terminal surfaces are rough and not amenable to patterning by directional dry-etching techniques. Nagpal et al. (p. 594 ) use patterned silicon substrates on which they add gold, silver, or copper and then apply an epoxy layer to the deposited metal. When pulled apart, the metal separates from the silicon, where the adhesion is poorer, leaving an ultra-smooth surface. The resulting surface plasmon propagation lengths approach the theoretical values for perfectly flat films.