A New High Electron Mobility Transistor (HEMT) Structure with a Narrow Quantum Well Formed by Inserting a Few Monolayers in the Channel

Abstract

A new HEMT wafer has been developed whose channel layer has a narrow bandgap semiconductor with a few monolayers inserted at an optimum position in the channel, namely, the point where the probability density of electrons is maximum in the lowest subband and negligible in the first excited subband. The Al 0.22 Ga 0.78 As/In 0.15 Ga 0.85 As pseudomorphic HEMT wafer with one InAs monolayer inserted at the optimum position has provided Hall electron mobility increments nearly 15% higher at 300 K and 20% higher at 77 K than those of conventional pseudomorphic HEMT wafers.