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Determination of the absolute structure factor for the forbidden (222) reflection in silicon using 0.12-Å<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>γ</mml:mi></mml:math>rays
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Citations
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References
1982
Year
Math XmlnsShort Wavelength OpticRoom-temperature DeterminationEngineeringRadiation DetectionPhysicsOptical PropertiesMissouri Research ReactorApplied PhysicsCondensed Matter PhysicsX-ray DiffractionAtomic PhysicsAbsolute Structure FactorNeutron ScatteringCrystallographySynchrotron Radiation Source
A room-temperature determination of the absolute structure factor for the forbidden (222) reflection in silicon has been conducted at the University of Missouri Research Reactor with 103-keV gamma rays. The measured structure factor of $F(222)=1.456$ is in excellent agreement with five of the earlier intensity measurements, and is significantly different from any value determined using Pendell\"osung techniques. An increase in accuracy over previous intensity measurements by a factor of between 2 and 10 has been achieved and is made possible through the use of monoenergetic, short-wavelength gamma rays, which allow absolute measurements to be made in Laue geometry on relatively thick crystals (\ensuremath{\sim}1 mm) without encountering extinction problems.
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