Wafer‐Level Patterned and Aligned Polymer Nanowire/Micro‐ and Nanotube Arrays on any Substrate

Abstract

A novel technique for fabrication of patterned and aligned polymer-nanowire/micro-and nanotube (PNW/PNT) arrays on a wafer-level substrate of any material is reported. By creating a designed pattern on a spin-coated polymer film using techniques, such as stamping or micro-tip writing, plasma etching results in the formation of aligned PNW arrays distributed according to the pattern. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.