Fabrication of transparent p–n heterojunction thin film diodes based entirely on oxide semiconductors

Abstract

All oxide-based, transparent polycrystalline p–n heterojunctions on a glass substrate were fabricated. The structure of the diode was n+-ZnO electrode/n-ZnO/p-SrCu2O2/In2−xSnxO3 electrode on the substrate. The contact between the n- and p-type semiconducting oxides was found to be rectifying. The ratio of forward current to the reverse current exceeded 80 within the range of applied voltages of −1.5 to +1.5 V and the estimated diode factor (n value) was 1.62. The diode structure was fabricated on a glass plate with the total thickness of 1.3 μm and possessed an optical transmission of 70%–80% in the visible region.