Publication | Closed Access
Deposition of hydrogenated amorphous silicon (a-Si:H) films by hot-wire chemical vapor deposition (HW-CVD) method: Role of substrate temperature
22
Citations
36
References
2007
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsSubstrate TemperatureAmorphous SiliconSemiconductor Device FabricationThin FilmsSilicon On InsulatorAmorphous SolidChemical Vapor DepositionThin Film Processing
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