Publication | Open Access
Formation principles of two-dimensional compound photonic lattices by one-step holographic lithography
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2005
Year
Quantum Lattice SystemEngineeringWave OpticHolographic MethodAppropriate Polarization ConfigurationsPhotonic CrystalsBeam LithographyOptical PropertiesNoncoplanar Elliptical WavesNanolithography MethodNanophotonicsMaterials SciencePhotonicsPhysicsOne-step Holographic LithographyRelative PositionPhotonic DeviceCrystallographyFormation PrinciplesApplied PhysicsOptoelectronicsWave Interference
From the view of crystallography, a systematic theoretical study on one-step formation of two-dimensional compound photonic lattices by four noncoplanar elliptical waves is presented. A general formula for the interference intensity of N elliptically polarized waves, and relevant phase shifts that compensate for the initial phases and control the relative position and size of the motifs, have been deduced. Using appropriate polarization configurations, four kinds of beam geometries can be used to form various compound lattices. This provides an ideal new experimental platform for fabricating large-area compound photonic lattices.